

Equivalent to Fujimi FO Lapping Powder

Physical properties and Chemical composition %
|
item |
Size |
Specific gravity (g/cm3) |
chemical(%) |
||||
|
Al2O3 |
SiO2 |
Fe2O3 |
TiO2 |
ZrO2 |
|||
|
FO |
#800-#1200 |
≥3.90 |
≥45.0 |
≤20.0 |
≤0.5 |
≤2.0 |
≤33.0 |
|
#1500-3000 |
≥3.90 |
≥40.5 |
≤25.0 |
≤0.7 |
≤2.0 |
≤33.0 |
|
PSD(Particle Size Distribution)
|
Size |
D0 |
D3 |
D50 |
D94 |
|
#800 |
≤32.0 |
≤27.0 |
11.3±0.9 |
≥6.5 |
|
#1000 |
≤27.0 |
≤23.0 |
9.4±0.8 |
≥5.0 |
|
#1200 |
≤23.0 |
≤20.0 |
7.1±0.7 |
≥4.0 |
|
#1500 |
≤19.0 |
≤17.0 |
5.5±0.5 |
≥3.0 |
|
#2000 |
≤15.0 |
≤14.0 |
4.5±0.4 |
≥2.0 |
|
#3000 |
≤12.0 |
≤11.0 |
3.6±0.4 |
≥1.5 |
Main Applications
--Grinding and polishing of semiconductor wafers
--Surface finishing of various optical glasses
--Grinding and polishing of lenses, prisms, mirrors, filters, etc. of optical crystals.
--Surface finishing of piezoelectric materials
Packing
10kgs pvc bags+pallet
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